DOW XR-1541

Harmonization Code : 3403.19 | Lubricating Preparations (With 70% or More Petroleum Oils) For Automotive and Other Uses

DOW XR-1541

Main features

  • E-Beam Patternable, Negative Tone
  • Etch Resistance Surface Treatment
  • High Purity Surface Treatment

Product Description

Dow Corning® XR-1541 E-Beam Resist is a hydrogen silsesquioxane (HSQ)-based negative-tone electron beam resist formulated for high-resolution lithography applications. Supplied as a semiconductor-grade HSQ resin dissolved in methyl isobutyl ketone (MIBK), it supports direct-write patterning with feature sizes as small as 6 nm. The material is processed to high purity with trace metal impurities below 10 ppb and can produce thin films from approximately 30 to 180 nm in a single spin-coated layer, depending on formulation. XR-1541 is commonly evaluated for mask fabrication and next-generation lithography processes where fine pattern definition, thin-film control, and aqueous-base development are important.

Key features

  • 6 nm minimum feature size: Supports ultra-fine electron beam pattern definition for advanced lithography applications.
  • High-purity formulation: Processed to semiconductor-grade purity with trace metal impurities below 10 ppb.
  • Thin-film capability: Available in formulations that produce spin-coated film thicknesses from approximately 30 to 180 nm.

Applications / Suitable for

  • Mask making
  • Next-generation lithography processing
  • High-resolution electron beam patterning
  • Nanoscale feature fabrication
Product Family

DOW XR-1541

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TDS, SDS & Technical Documents

Technical Specifications

General Properties
Refractive index
The refractive index determines how much the path of light is bent, or refracted, when entering a material. It is calculated by taking into account the velocity of light in vacuum compared to the velocity of light in the material. The refractive index calculation can be affected by the wavelength of light and the temperature of the material. Even though it is usually reported on standard wavelengths it is advised to check the TDS for the precise test parameters.
1.41

Additional Information

Technical properties

As-supplied / before-processing properties

Representative properties reported for the supplied electron beam resist formulation.

Property Value Unit Method / condition
Minimum Feature Size 6 nm Typical property
Edge Definition 3.3 nm Typical property
Refractive Index 1.41 - Typical property
Trace Metal Impurities <10 ppb Semiconductor-grade purity
Shelf Life at 5°C 6 months Stored at 5°C
Spin-Coated Film Thickness 30-180 nm Depending on formulation concentration

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